Thermal and E‑beam Evaporation

High Power Optimization Tools for a High Energy Process

Advanced optical device fabrication calls for advanced technologies like in situ tools for feedback control of key evaporation parameters such as stress, curvature and bow in real-time.

E-beam evaporation utilizes a high energy electron beam to bombard the source material target, heating the target in high vacuum to a high vapor pressure, resulting in atomic or molecular diffusion of the material to the substrate, where it is deposited by condensation. As with sputtering or PLD, important real-time information related to film characteristics at the surface can be obtained with the right tools.

Leybold e-beam based coater tool equipped with kSA MOS system for real-time curvature and stress measurement.

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