Thin-film Characterization Services
k-Space utilizes its world class metrology tools to offer in-house wafer and sample characterization. Our thin-film characterization tools can perform full wafer/sample maps of curvature, bow height, tilt, and absolute reflectivity at 660nm. We can also perform spectral reflectivity, absolute transmission, optical absorption edge, and temperature-dependent optical absorption edge measurements.
Wafer Curvature, Bow Height, and Tilt Characterization
- Standard Wafer Sizes: 2-inch, 3-inch, 100mm, 150mm, 200mm and 300mm. Wafers/samples must be mirror-like or near mirror-like surface quality (can see reflection in sample)
- Custom sizes can be measured but may require machining of custom sample holder (quoted separately)
- Scan Types:
- line scan
- Selectable area scan, up to full wafer with 5mm edge exclusion
- Scan resolution: 1um
- Maximum radius of curvature and bow height are sample size dependent. Full area scans can be performed on wafer diameters to 300mm if radius of curvature is >= 10m.
- Curvature resolution: <= 2e-5 (1/m)
- Bow height resolution: <= 0.01um
- Tilt resolution: <= 0.01 arcsec
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